Toshiba Memory Corporation, the world’s leading manufacturer of high-performance flash memory solutions, has celebrated the founding of the first K1 semiconductor production facility in Kitakami, Iwate Prefecture, Japan. This factory will be completed in autumn 2019 and will be one of the most modern 3D flash memory production facilities in the world.
Toshiba Memory maintains its leading position in the competitive flash memory industry
Toshiba builds the largest and most modern flash memory factory in the world
Toshiba Memory is a leader in the development of its BiCS flash technology, its patented 3D flash memory, which is the most advanced on the market. The demand for 3D flash memory is increasing significantly due to the growing demand for enterprise servers, data centers, and smartphones. The new Toshiba installation will make an important contribution to improving the worldwide availability of this valuable resource.
The new facility will be Toshiba’s largest and most modern. It is built with a seismic insulation structure that makes it possible to absorb earthquakes and reduce environmental pollution by using state-of-the-art energy-saving production facilities. It also introduces an advanced production system that uses artificial intelligence to increase productivity.
Toshiba Memory expects to continue its investments in joint ventures in the new facilities based on ongoing discussions with Western Digital Corporation. Toshiba Memory will continue to actively promote initiatives to strengthen competitiveness, including timely investments and R&D in line with market trends. The company will also contribute to the development of the regional economy of Iwata Prefecture.
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