China is continuing its efforts to reduce its dependence on imported raw materials and components for 7nm production. A new step in this direction is the development of household photoresist – a material without its use it is impossible to transfer the electronic circuit pattern to a silicon crystal. The new material is so good that it can be used for 7 nm process technology.
R&D to produce a highly sensitive photoresist was reported by Nata Opto of Jiangsu. The new photosensitive material, which is produced in the company’s laboratories will aid in the transition to household materials when produced with technological standards from 28 to 7 nm. Previously, a photoresist was produced in China that is only suitable for the production of chips with standards of 436 and 365nm.
7nm, lower dependencies on external sources
For more advanced technical processes, Chinese manufacturers, e.g. SMIC and YMTC, buy photoresists from Japanese and American companies. Five US and Japanese manufacturers have an 85% share of the world market for photoresists, and EUV lithography material is produced exclusively by the Japanese, which has even affected South Korean manufacturers.
However, EUV lithography photoresist will soon be needed by Chinese companies. Definitely in bulk quantities. But the photoresist for chip production in the 28 to 7 nm range can replace the imported one, however, in about three years this will happen.
The developer is currently starting to supply photoresists to customers for testing. If all goes well, Nata Opto plans to produce up to 25 tons of photoresist per year in three years for Excimer ArF 193nm lasers for dry projection and immersion with liquid immersion plates.